{"version":"1.0","type":"link","title":"Isotropic etching - Newikis","description":"In semiconductor manufacturing, isotropic etching is a method commonly used to remove material from a substrate via a chemical process using an etchant substance. The etchant may be in liquid-, gas- or plasma-phase, although liquid etchants such as buffered hydrofluoric acid (BHF) for silicon…","provider_name":"Newikis","provider_url":"https://newikis.com","cache_age":86400}