10 µm process

The 10 μm process (10 micrometer process) is the level of MOSFET semiconductor process technology that was commercially reached around 1971, by companies such as RCA and Intel.

The 10 μm process refers to the minimum size that could be reliably produced: the half-pitch, which is the distance between two 1-metal lanes, center to center, and the gate length of a transistor; those two values used to be identical in early nodes. The smallest transistors and other circuit elements on a chip made with this process were around 10 micrometers wide.

Products featuring 10 μm manufacturing process

RCA's CD4000 series of integrated circuits began with a 20 μm process in 1968, before gradually downscaling and eventually reaching 10 μm in the next several years.
Intel 1103, an early dynamic random-access memory (DRAM) chip launched in 1970, used an 8 μm process.
Intel 4004 CPU launched in 1971 was manufactured using a 10 μm process.
Intel 8008 CPU launched in 1972 was manufactured using this process.

References

↑ Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.
↑ Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.
↑ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588.
↑ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm², and sold for around $21.
1 2 "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.

External links

Brief timeline of microprocessor development Archived 3 March 2012 at the Wayback Machine

Preceded by 20 μm process	MOSFET semiconductor device fabrication process	Succeeded by 6 μm process

This nanotechnology-related article is a stub. You can help Wikipedia by adding missing information.

[1] Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.

[2] Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.

[Lojek330-3] Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588.

[Lojek-1103-4] Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm², and sold for around $21.

[listoid-5] 1 2 "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.

Semiconductor device fabrication

MOSFET scaling (process nodes)
20 μm – 1968 10 μm – 1971 6 μm – 1974 3 μm – 1977 1.5 μm – 1981 1 μm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 90 nm – 2003 65 nm – 2005 45 nm – 2007 32 nm – 2009 22 nm – 2012 14 nm – 2014 10 nm – 2016 7 nm – 2018 5 nm – 2020 3 nm – 2022 2 nm – 2025
Future 1 nm ~ 2027
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
v t e